CPC G03F 7/70033 (2013.01) [G02B 5/0808 (2013.01); G03F 7/2063 (2013.01); G03F 7/70716 (2013.01); G03F 7/70916 (2013.01); H01L 21/0275 (2013.01)] | 20 Claims |
1. A method for a lithography exposing process, comprising:
placing a reticle over a reticle stage;
generating a light beam by irradiating a droplet by a laser;
directing, by one or more optics, a first portion of the light beam to a plurality of light permeable protrusions formed on a reflection layer, wherein the light permeable protrusions are made of SiO2, and the reflection layer comprises a material different from SiO2; and
directing, by the light permeable protrusions and the reflection layer, the first portion of the light beam to the reticle.
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