US 11,753,702 B2
Molybdenum containing targets
Gary Alan Rozak, Akron, OH (US); Mark E. Gaydos, Nashua, NH (US); Patrick Alan Hogan, Somerville, MA (US); and Shuwei Sun, Framingham, MA (US)
Assigned to H.C. Starck Solutions Euclid, LLC, Euclid, OH (US)
Filed by H.C. STARCK, INC., Newton, MA (US)
Filed on Sep. 30, 2020, as Appl. No. 17/38,325.
Application 17/038,325 is a continuation of application No. 15/908,896, filed on Mar. 1, 2018, granted, now 10,829,849.
Application 15/908,896 is a continuation of application No. 14/669,258, filed on Mar. 26, 2015, granted, now 9,945,023, issued on Apr. 17, 2018.
Application 14/669,258 is a continuation of application No. 13/856,617, filed on Apr. 4, 2013, granted, now 9,017,762, issued on Apr. 28, 2015.
Application 13/856,617 is a continuation of application No. 12/827,550, filed on Jun. 30, 2010, granted, now 8,449,817, issued on May 28, 2013.
Prior Publication US 2021/0079512 A1, Mar. 18, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C22C 45/10 (2006.01); C22C 1/04 (2023.01); C22C 27/04 (2006.01); C23C 14/34 (2006.01); C23C 14/18 (2006.01); C23C 14/58 (2006.01); G06F 3/041 (2006.01)
CPC C22C 1/045 (2013.01) [C22C 27/04 (2013.01); C23C 14/185 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C23C 14/5873 (2013.01); G06F 3/041 (2013.01); B22F 2998/10 (2013.01); G06F 2203/04103 (2013.01); Y10T 428/12743 (2015.01); Y10T 428/12826 (2015.01); Y10T 428/265 (2015.01); Y10T 428/31678 (2015.04)] 17 Claims
OG exemplary drawing
 
1. A sputter target that is sputterable to form a film comprising an alloy, the sputter target comprising molybdenum, titanium, vanadium, chromium, tantalum, and niobium,
wherein (i) a total concentration of molybdenum, titanium, vanadium, chromium, tantalum, and niobium in the sputter target is 99 atomic percent or more, based on the total number of atoms in the sputter target, and (ii) the sputter target contains at least 50 atomic percent molybdenum.