| US 7,590,506 B2 | ||
| Pattern measurement apparatus and pattern measuring method | ||
| Jun Matsumoto, Tokyo (Japan) | ||
| Assigned to Advantest Corp., Tokyo (Japan) | ||
| Filed on Mar. 27, 2007, as Appl. No. 11/728,822. | ||
| Claims priority of application No. 2006-090290 (JP), filed on Mar. 29, 2006; and application No. 2007-040858 (JP), filed on Feb. 21, 2007. | ||
| Prior Publication US 2008/0015813 A1, Jan. 17, 2008 | ||
| Int. Cl. G01B 5/004 (2006.01) | ||
| U.S. Cl. 702—167 | 9 Claims |
| 1. A pattern measurement apparatus comprising:
a line profile creating unit for creating a line profile of a pattern formed on a sample by scanning with a charged particle
beam;
a derivative profile creating unit for creating a second derivative profile by differentiating twice the line profile; and
an edge detecting unit for judging whether a cross-sectional edge in the pattern is a rising edge or a falling edge based
on a relationship between two positive peak positions and two peak values appearing at locations of both sides of each cross-sectional
edge of the pattern obtained from the second derivative profile.
|