| US 7,589,819 B2 | ||
| Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems | ||
| Nabila Baba-Ali, Paris (France) | ||
| Assigned to ASML Holding N.V., Veldhoven (Netherlands) | ||
| Filed on Jun. 15, 2006, as Appl. No. 11/453,039. | ||
| Application 11/453039 is a division of application No. 10/439326, filed on May 16, 2003, granted, now 7,063,920, filed on Jun. 20, 2006. | ||
| Prior Publication US 2006/0236295 A1, Oct. 19, 2006 | ||
| Int. Cl. G03B 27/42 (2006.01); G03B 27/32 (2006.01) | ||
| U.S. Cl. 355—53 [355/77; 716/19; 716/20; 716/21; 430/30] | 13 Claims |
| 1. An apparatus comprising:
a memory; and
one or more processors coupled to the memory and configured to,
generate an ideal mask layout representative of image characteristics associated with a desired image, and
generate an equivalent array-of-mirrors layout in accordance with an average intensity of the ideal mask layout.
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