| US 7,589,336 B2 | ||
| Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors | ||
| Andrzei Kaszuba, San Jose, Calif. (US); Juan Carlos Rocha-Alvarez, Sunnyvale, Calif. (US); Thomas Nowak, Cupertino, Calif. (US); Sanjeev Baluja, San Francisco, Calif. (US); and Ndanka O. Mukuti, Santa Clara, Calif. (US) | ||
| Assigned to Applied Materials, Inc., Santa Clara, Calif. (US) | ||
| Filed on Mar. 15, 2007, as Appl. No. 11/686,897. | ||
| Claims priority of provisional application 60/886906, filed on Jan. 26, 2007. | ||
| Claims priority of provisional application 60/816660, filed on Jun. 26, 2006. | ||
| Claims priority of provisional application 60/816723, filed on Jun. 26, 2006. | ||
| Claims priority of provisional application 60/783421, filed on Mar. 17, 2006. | ||
| Prior Publication US 2007/0228289 A1, Oct. 04, 2007 | ||
| Int. Cl. C23C 16/453 (2006.01); B05C 11/10 (2006.01) | ||
| U.S. Cl. 250—504R [250/492.1; 362/294; 362/341; 362/321; 362/345] | 23 Claims |
| 1. A substrate processing tool comprising:
a body defining a substrate processing region;
a substrate support adapted to support a substantially flat substrate within the substrate processing region;
an ultraviolet (UV) radiation lamp spaced apart from the substrate support and configured to generate and transmit ultraviolet
radiation to a substrate positioned on the substrate support, the UV radiation lamp comprising a source of UV radiation and
a primary reflector partially surrounding the source of UV radiation;
a secondary reflector positioned between the primary reflector and the substrate support configured to reduce light loss outside
the substrate, the secondary reflector having an inner and outer surface and at least one hole traversing the reflector from
the inner surface to the outer surface; and
a light detector positioned to receive UV radiation light generated by the UV radiation lamp transmitted through the at least
one hole.
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