US 7,589,096 B2
Azole derivatives
Norikazu Otake, Tsukuba (Japan); Yuji Haga, Tsukuba (Japan); Makoto Jitsuoka, Tsukuba (Japan); and Akio Kanatani, Tsukuba (Japan)
Assigned to Banyu Pharmaceutical Co., Ltd., Tokyo (Japan)
Filed on Feb. 26, 2008, as Appl. No. 12/71,808.
Application 12/071808 is a division of application No. 10/536360, granted, now 7,365,079, previously published as PCT/JP03/15018, filed on Nov. 25, 2003.
Claims priority of application No. 2002-346997 (JP), filed on Nov. 29, 2002.
Prior Publication US 2008/0188507 A1, Aug. 07, 2008
Int. Cl. A61K 31/438 (2006.01); A61K 31/506 (2006.01); A61K 31/4545 (2006.01); C07D 233/96 (2006.01); C07D 401/14 (2006.01); C07D 401/02 (2006.01)
U.S. Cl. 514—256  [514/278; 544/230; 546/17] 23 Claims
 
1. A compound of the formula (I):

OG Complex Work Unit Drawing
wherein Az is a group comprising a monocyclic azole or a bicyclic aromatic ring of the same or different fused azoles, which is optionally substituted by a substituent selected from the group consisting of halogen, cyano, lower alkyl, halo-lower alkyl, hydroxy, lower alkoxy, halo-lower alkoxy, lower alkoxycarbonyl, lower alkylsulfonyl, lower alkylsulfonyloxy, —N(R1)R2 and -Q1-Ar1;
Ar1 is aryl or heteroaryl, any of which is optionally substituted by a substituent selected from the group consisting of halogen, nitro, oxo, hydroxy, lower alkyl, halo-lower alkyl, hydroxy-lower alkyl, cyclo-lower alkyl, lower alkenyl, lower alkoxy, halo-lower alkoxy, lower alkylthio, lower alkylsulfonyl, carboxyl, lower alkanoyl, lower alkoxycarbonyl, lower alkanoylamino and -Q2-Ar2;
Ar2 is aryl or heteroaryl, any of which is optionally substituted by a substituent selected from the group consisting of halogen, cyano, lower alkyl, halo-lower alkyl, hydroxy-lower alkyl, hydroxy, lower alkoxy, halo-lower alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl;
Q1 and Q2 are independently a single bond, oxygen atom, carbonyl or —N(R3)—;
R1 and R2 are independently hydrogen atom or lower alkyl, or R1 and R2, taken together, form lower alkylene which may be interrupted by oxygen atom, sulfur atom or imino;
R3 is hydrogen atom or lower alkyl;
T, V and W are methine, said methine being optionally substituted by a substituent selected from the group consisting of halogen, lower alkyl, halo-lower alkyl, hydroxy, lower alkoxy and halo-lower alkoxy; U is nitrogen atom; and
X is nitrogen atom,
or a salt or ester thereof.