US 7,586,626 B2
Measurement method, exposure method, exposure apparatus, and device fabrication method
Kenji Yamazoe, Utsunomiya (Japan)
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan)
Filed on Jan. 09, 2008, as Appl. No. 11/971,506.
Claims priority of application No. 2007-005084 (JP), filed on Jan. 12, 2007.
Prior Publication US 2008/0170240 A1, Jul. 17, 2008
Int. Cl. G01B 11/14 (2006.01)
U.S. Cl. 356—620  [356/400; 355/53] 12 Claims
OG exemplary drawing
 
1. A method for measuring a synchronization error between a first stage and a second stage in a scanning exposure apparatus including the first stage which supports a reticle, the second stage which supports a substrate, and a projection optical system which projects a pattern of the reticle onto the substrate, the method comprising the steps of:
measuring, using a measurement unit, a light intensity distribution formed by a measurement pattern while synchronously scanning a measurement mask which has the measurement pattern and is arranged on the first stage, and the measurement unit arranged on the second stage; and
calculating the synchronization error between the first stage and the second stage based on a time change in the light intensity distribution measured in the measuring step.