| US 7,586,582 B2 | ||
| Exposure apparatus | ||
| Hideki Ina, Toshima-ku (Japan); Koichi Sentoku, Kawachi-gun (Japan); Gaku Takahashi, Ustunomiya (Japan); and Yoshinori Miwa, Ustunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Aug. 03, 2006, as Appl. No. 11/462,175. | ||
| Claims priority of application No. 2005-230840 (JP), filed on Aug. 09, 2005. | ||
| Prior Publication US 2007/0035708 A1, Feb. 15, 2007 | ||
| Int. Cl. G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—53 [355/30] | 3 Claims |
| 1. An exposure apparatus for exposing a substrate to light under a vacuum atmosphere, the apparatus comprising:
a vacuum chamber;
an evacuating device configured to evacuate the vacuum chamber;
a sensor arranged in the vacuum chamber and configured to measure at least any one of the position and the height of a substrate;
a cover arranged in the vacuum chamber and configured to contain and hermetically seal at least part of the sensor, the cover
including a transparent plate, through which measurement light from the sensor passes;
a supply pipe connected to the cover and configured to supply gas to a space in the cover;
a discharge pipe connected to the cover and configured to discharge gas from the space in the cover; and
a pressure controlling device configured to control an amount of gas supplied by the supply pipe and discharged by the discharge
pipe so that the pressure of the space in the cover is maintained equal to an atmospheric pressure.
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