| US 7,585,599 B2 | ||
| Photomask, and method and apparatus for producing the same | ||
| Yoshikazu Nagamura, Hyogo (Japan); Kouji Tange, Hyogo (Japan); Kouki Hayashi, Tokyo (Japan); and Hidehiro Ikeda, Tokyo (Japan) | ||
| Assigned to Renesas Technology Corp., Tokyo (Japan) | ||
| Filed on Jul. 30, 2007, as Appl. No. 11/878,969. | ||
| Application 11/878969 is a continuation of application No. 10/714362, filed on Nov. 17, 2003, granted, now 7,264,905. | ||
| Claims priority of application No. 2003-024125 (JP), filed on Jan. 31, 2003. | ||
| Prior Publication US 2008/0020298 A1, Jan. 24, 2008 | ||
| Int. Cl. G03F 1/00 (2006.01) | ||
| U.S. Cl. 430—5 | 2 Claims |
| 1. A method for producing a half tone mask comprising a transparent substrate and a semitransparent film or shading film provided
on the transparent substrate, comprising the steps of:
when an opaque defect portion, which is a portion projected from the outer periphery of a complete pattern in which the semitransparent
film or shading film is completely well formed, is formed, removing said opaque defect portion and the vicinity thereof; and
forming a semitransparent portion on said transparent substrate in said removed opaque defect portion and said removed vicinity
thereof.
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