| US 7,585,551 B2 | ||
| Polyimide resin polymer and alignment film materials containing same for liquid crystal display | ||
| Ming-Ruei Tsai, Kaohsiung (Taiwan); Wen-Chung C Chu, Kaohsiung (Taiwan); Chang Chia-Wen, Kaohsiung (Taiwan); and Lai Ming-Chih, Kaohsiung (Taiwan) | ||
| Assigned to Daxin Materials Corporation, Hsinchu County (Taiwan) | ||
| Filed on Jun. 29, 2007, as Appl. No. 11/824,205. | ||
| Claims priority of application No. 95124014 A (TW), filed on Jun. 30, 2006. | ||
| Prior Publication US 2008/0020149 A1, Jan. 24, 2008 | ||
| Int. Cl. C09K 19/00 (2006.01) | ||
| U.S. Cl. 428—1.26 [528/310] | 13 Claims |
1. A polyimide resin polymer, containing at least one repeating unit selected from those of formula (A-1) and formula (A-2),
![]() wherein, P1 is a tetravalent organic radical, and Q1 is a group of formula (Q-1) or formula (Q-2);
![]() wherein, P2 is a tetravalent organic radical, and Q2 is a group of formula (Q-1) or formula (Q-2);
![]() wherein R1, R2, and R3 independently represent hydrogen, halogen, C1-C10 alkyl, or a monovalent, fluorine-containing C1-C10 organic radical, with the proviso that R1, R2, and R3 can not all be hydrogen;
X1 is —COO—, —CO—, —OCO—, —NHCO—, —CONH—, or —S—;
R4 is a monovalent C1-C40 organic radical with an aliphatic or an aromatic or both skeletons; and
![]() wherein R5 and R7 independently represent hydrogen, halogen, C1-C10 alkyl or a monovalent, fluorine-containing C1-C10 organic radical;
R6 is C1-C10 alkyl or a monovalent, fluorine-containing C1-C10 organic radical;
X2 is O or S; and
X1 and R4 are as defined above.
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