US 7,585,545 B2
Hydrogen sulfide injection method for phosphor deposition
Yongbao Xin, Mississauga (Canada); Joe Acchione, Caledon (Canada); and Terry Hunt, Acton (Canada)
Assigned to Ifire IP Corporation, Fort Saskatchewan, Alberta (Canada)
Filed on Jun. 28, 2004, as Appl. No. 10/878,221.
Claims priority of provisional application 60/484290, filed on Jul. 03, 2003.
Prior Publication US 2005/0025887 A1, Feb. 03, 2005
Int. Cl. C23C 16/00 (2006.01)
U.S. Cl. 427—248.1  [427/255.23; 427/255.29; 427/255.28; 427/255.7] 31 Claims
OG exemplary drawing
 
1. A method of vacuum evaporation of a multi-element sulfur bearing thin film composition onto a substrate, the method comprising;
within a deposition chamber, providing a source of gas or vapour sulfur species targeted at one or more source materials that make up at least part of the thin film composition during evaporation of the one or more source materials, wherein said gas or vapour sulfur species is provided at a flow rate directed at the source materials to disperse the gas or vapour sulfur species across the surface of the source materials at a higher partial pressure compared to the pressure throughout said deposition chamber, and wherein there is a chemical interaction of the gas or vapour sulfur species with evaporant from said one or more source materials during deposition of said thin film composition.