| US 7,584,753 B2 | ||
| Demand and dilution mask regulator and method of regulating additional oxygen in the mask regulator | ||
| Séverine Aubonnet, Viroflay (France); Patrick Maire, Raizeux (France); Didier Lamourette, Les Essarts le Roi (France); and Benoît Estaca Sagot, Levallois-Perret (France) | ||
| Assigned to Intertechnique, (France) | ||
| Appl. No. 10/576,912 PCT Filed Jul. 15, 2004, PCT No. PCT/EP2004/009163 § 371(c)(1), (2), (4) Date Apr. 24, 2006, PCT Pub. No. WO2006/005372, PCT Pub. Date Jan. 19, 2006. |
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| Prior Publication US 2007/0107729 A1, May 17, 2007 | ||
| Int. Cl. A61M 11/00 (2006.01) | ||
| U.S. Cl. 128—204.25 [128/204.24; 128/204.18] | 7 Claims |
| 1. A demand and dilution mask regulator comprising:
an oxygen feed circuit connecting, through a first flow path, a pressurized inlet for oxygen coming from an oxygen source
and admitted into a mixing chamber leading to a breathing mask, via an electrically-controlled valve for controlling the oxygen
flow rate,
a dilution circuit supplying air, through a second flow path, from an inlet connected to an air source, to an outlet leading
to the mixing chamber, characterized in that the second flow path comprises a Venturi constriction and a capillary duct having
an inlet port connected to the Venturi constriction and an outlet port connected to a pressure sensor.
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