CPC G03F 7/422 (2013.01) [G03F 7/0042 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/0273 (2013.01); H01L 21/02087 (2013.01); H01L 21/67051 (2013.01)] | 20 Claims |
1. A method of cleaning a substrate provided with a metal-based resist, the method comprising cleaning a substrate provided with a metal-based resist comprising at least one metal selected from the group consisting of Sn, Hf, Zr, In, Te, Sb, Ni, Co, Ti, W, Ta, and Mo using a metal resist cleaning liquid comprising an organic solvent and a carboxylic acid, thereby removing the metal-based resist from the substrate.
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