US 7,583,012 B2
Piezoelectric element and method for manufacturing piezoelectric element
Eiji Nakashio, Miyagi (Japan); Junichi Honda, Miyagi (Japan); Takashi Tamura, Miyagi (Japan); Koji Suzuki, Miyagi (Japan); Teruo Inaguma, Miyagi (Japan); Manabu Aizawa, Miyagi (Japan); Kazuo Takahashi, Miyagi (Japan); and Tadashi Sakurai, Miyagi (Japan)
Assigned to Sony Corporation, Tokyo (Japan)
Filed on Mar. 03, 2006, as Appl. No. 11/367,996.
Claims priority of application No. P2005-061694 (JP), filed on Mar. 04, 2005; application No. P2005-061695 (JP), filed on Mar. 04, 2005; application No. P2005-061696 (JP), filed on Mar. 04, 2005; application No. P2005-190234 (JP), filed on Jun. 29, 2005; and application No. P2005-378321 (JP), filed on Dec. 28, 2005.
Prior Publication US 2006/0197415 A1, Sep. 07, 2006
Int. Cl. H01L 41/08 (2006.01)
U.S. Cl. 310—358  [310/330; 310/331; 310/364] 10 Claims
OG exemplary drawing
 
1. A piezoelectric element comprising:
a substrate;
a first electrode film disposed on the substrate;
a piezoelectric film disposed on the first electrode film; and
a second electrode film disposed on the piezoelectric film,
wherein,
the piezoelectric film has a laminated structure composed of a plurality of crystallized piezoelectric thin films,
the first electrode film comprises a laminated film of a titanium layer and a platinum layer, the titanium layer having a thickness within the range of 5 nm or more to 20 nm or less, and
the second electrode film comprises separate portions providing a driving electrode and at least one detection electrode.