| US 7,582,868 B2 | ||
| Method of nano thin film thickness measurement by auger electron spectroscopy | ||
| Zhi Cheng Jiang, Dongguan (China); Shan Dan Li, Dongguan (China); Yuen Kwan Kam, Dongguan (China); and Yi Wei Liu, Dongguan (China) | ||
| Assigned to SAE Magnetics (H.K.) Ltd., Shatin, N.T. (Hong Kong Special Administrative Region of the People's Republic of China, The) | ||
| Filed on Jul. 27, 2005, as Appl. No. 11/192,199. | ||
| Claims priority of application No. PCT/CN2004/001529 (WO), filed on Dec. 27, 2004. | ||
| Prior Publication US 2006/0138326 A1, Jun. 29, 2006 | ||
| Int. Cl. G01N 23/00 (2006.01) | ||
| U.S. Cl. 250—307 [250/306] | 18 Claims |
| 1. A thickness measurement method, comprising:
performing an Auger electron spectroscopy analysis on a thin film layer on a substrate;
collecting a set of auger electron spectroscopy data of the thin film layer;
performing a calculation on the set of data using a predetermined mathematical model; and
determining a thickness of the thin film layer based on the calculation, wherein at least a first thin film layer and a second
thin film layer having a combined thickness are applied to the substrate.
|