| US 7,582,356 B2 | ||
| Glazing provided with stacked thin layers which reflect infrared rays and/or solar radiation | ||
| Jean-Pierre Brochot, Aubervilliers (France); and Sylvain Belliot, Aubervilliers (France) | ||
| Assigned to Saint-Gobain Glass France, Courbevoie (France) | ||
| Appl. No. 10/562,221 PCT Filed Jun. 25, 2004, PCT No. PCT/FR2004/001622 § 371(c)(1), (2), (4) Date Apr. 24, 2006, PCT Pub. No. WO2005/000761, PCT Pub. Date Jan. 06, 2005. |
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| Claims priority of application No. 03 07749 (FR), filed on Jun. 26, 2003. | ||
| Prior Publication US 2006/0257670 A1, Nov. 16, 2006 | ||
| Int. Cl. B32B 17/06 (2006.01) | ||
| U.S. Cl. 428—432 [428/426; 428/428; 428/433; 428/448; 428/450; 428/472; 428/336; 428/689; 428/698; 428/699; 428/701; 428/702; 428/913] | 21 Claims |
| 1. A glazing assembly comprising at least one transparent substrate, provided with a thin-film multilayer comprising, in the
following order starting from the substrate:
(a) a first dielectric layer comprising a barrier layer acting as a barrier to the diffusion of oxygen and comprising silicon
nitrides;
(b) a lower stabilizing layer made of at least one metal or metal alloy X selected from the group consisting of titanium,
nickel, chromium, niobium, zirconium, tantalum, aluminum or a metal alloy containing at least one of these metals;
(c) a functional layer having reflection properties in the infrared and/or in the solar radiation;
(d) an upper metal blocking layer made of at least one metal or metal alloy Y selected from the group consisting of titanium,
nickel, chromium, niobium, zirconium, tantalum, aluminum or a metal alloy containing at least one of these metals;
(e) a second dielectric layer comprising a barrier layer acting as a barrier to the diffusion of oxygen and chosen from silicon
nitrides; and
(f) optionally, a protective oxide layer; in which multilayer the metal or alloy X of the lower stabilizing layer is different
from the metal or alloy Y of the upper blocking layer.
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