| US 7,581,551 B2 | ||
| Cleaning apparatus | ||
| Yoshitaka Kinomura, Gifu (Japan); Teruo Hiraoka, Tokyo (Japan); and Kojiro Ohkawa, Osaka (Japan) | ||
| Assigned to Sanyo Electric Co., Ltd., Osaka (Japan); Giga Tech Inc., Tokyo (Japan); and Ohkawa & Co., Ltd., Osaka (Japan) | ||
| Filed on Aug. 30, 2005, as Appl. No. 11/214,030. | ||
| Claims priority of application No. 2004-254656 (JP), filed on Sep. 01, 2004. | ||
| Prior Publication US 2006/0042669 A1, Mar. 02, 2006 | ||
| Int. Cl. B08B 3/04 (2006.01) | ||
| U.S. Cl. 134—76 [134/140; 134/902] | 6 Claims |
| 1. A cleaning apparatus for cleaning a deposition mask used for depositing organic electroluminescent materials, comprising:
a cleaning tank containing a cleaning solution therein;
a rinse tank containing a rinse solution therein; and
a carrying device that holds the deposition mask at a predetermined angle with respect to a horizontal direction, carries
the held deposition mask to the cleaning tank, retrieves the deposition mask from the cleaning tank and carries the retrieved
deposition mask to the rinse tank,
wherein the carrying device is configured to lay down horizontally to receive the deposition mask and to stand up in a vertical
direction to hold the received deposition mask at the predetermined angle,
the carrying device comprises a holding member that slides along a vertical guide portion to engage with a first edge portion
of the deposition mask and a hook that receives a second edge portion of the deposition mask when the holding member slides
to engage, and
the carrying device is configured so that, when the carrying device stands up, the deposition mask is held slanting from the
vertical guide portion between the sliding holding member and the receiving hook.
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