| US 7,580,116 B2 | ||
| Exposure apparatus and device fabrication method | ||
| Hironori Maeda, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, (Japan) | ||
| Filed on Jul. 07, 2008, as Appl. No. 12/168,341. | ||
| Claims priority of application No. 2007-180155 (JP), filed on Jul. 09, 2007. | ||
| Prior Publication US 2009/0015813 A1, Jan. 15, 2009 | ||
| Int. Cl. G03B 27/74 (2006.01); G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—68 [355/53] | 7 Claims |
| 1. An exposure apparatus comprising:
a projection optical system configured to project a pattern of a reticle onto a substrate; and
a position detection apparatus configured to detect at least one of a position of the reticle and a position of the substrate,
said position detection apparatus including
an optical system which includes an optical member whose position can be changed,
a photoelectric conversion device configured to receive light from a mark to detect the position of the reticle and the position
of the substrate via said optical system, and configured to output a detection signal, and
a control unit configured to control the position of said optical member based on information on a first evaluation value
representing a symmetry of a waveform of the detection signal at each of a plurality of positions of said optical member,
and information on a second evaluation value representing a position shift of the mark detected upon changing a position of
the mark in an optical axis direction of said optical system at each of the plurality of positions of said optical member,
wherein said control unit includes the information on the first evaluation value in advance.
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