| US 7,579,588 B2 | ||
| Base plate for use in mass spectrometry analysis, and method and apparatus for mass spectrometry analysis | ||
| Masayuki Naya, Ashigarakami-gun (Japan); and Hisashi Ohtsuka, Ashigarakami-gun (Japan) | ||
| Assigned to FUJIFILM Corporation, Tokyo (Japan) | ||
| Filed on Dec. 21, 2006, as Appl. No. 11/642,535. | ||
| Claims priority of application No. 2005-369441 (JP), filed on Dec. 22, 2005. | ||
| Prior Publication US 2007/0158549 A1, Jul. 12, 2007 | ||
| Int. Cl. H01J 49/00 (2006.01) | ||
| U.S. Cl. 250—288 | 8 Claims |
| 1. An analysis method using a base plate comprising, on at least a portion of the surface thereof, a roughened metal surface
capable of exciting local plasmon when exposed to laser light, the method comprising:
making a substance to be analyzed adhere to the roughened metal surface of the base plate;
applying laser light to the roughened metal surface to desorb the substance to be analyzed from the roughened metal surface;
and
capturing the desorbed substance to perform mass spectrometry analysis.
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