US 7,579,497 B2
Salt suitable for an acid generator and a chemically amplified resist composition containing the same
Yukako Harada, Settu (Japan); Ichiki Takemoto, Kawanishi (Japan); and Kouji Toishi, Toyonaka (Japan)
Assigned to Sumitomo Chemical Company, Limited, Tokyo (Japan)
Filed on Mar. 28, 2006, as Appl. No. 11/390,365.
Claims priority of application No. 2005-097486 (JP), filed on Mar. 30, 2005.
Prior Publication US 2007/0078269 A1, Apr. 05, 2007
Int. Cl. C07C 69/74 (2006.01); C07C 69/00 (2006.01); G03C 1/00 (2006.01)
U.S. Cl. 560—1  [560/129; 560/150; 430/270.1] 5 Claims
 
1. A salt of the formula (I):

OG Complex Work Unit Drawing
wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH2— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent a fluorine atom; n is an integer of 0 to 12; and A+ is a cation of the formula (IIa)

OG Complex Work Unit Drawing
wherein P1, P2 and P3 each independently represent hydrogen atom, hydroxyl group, alkyl group having 1 to 12 carbon atoms or alkoxy group having 1 to 12 carbon atoms.