| US 7,579,086 B2 | ||
| Substrate for use in crystallization and method for producing the same | ||
| Norihisa Mino, Osaka (Japan); and Yuusuke Takada, Katano (Japan) | ||
| Assigned to Matsushita Electric Industrial Co., Ltd., Osaka (Japan) | ||
| Filed on Dec. 23, 2004, as Appl. No. 11/20,063. | ||
| Claims priority of application No. 2003-427888 (JP), filed on Dec. 24, 2003. | ||
| Prior Publication US 2005/0158208 A1, Jul. 21, 2005 | ||
| Int. Cl. B32B 9/04 (2006.01) | ||
| U.S. Cl. 428—447 [427/387] | 20 Claims |
| 1. A substrate for use in crystallization comprising:
a base member having a surface; and
an organic molecular film on the surface of the base member,
the organic molecular film having a thickness of 0.5 to 100 nm,
the organic molecular film having non-affinity to a liquid to be crystallized, and
the organic molecular film being bound to the surface of the base member via a covalent bond,
wherein the surface of the substrate is formed with asperities having a plurality of protrusions with a height of 20 to 500
nm for supporting a droplet of the liquid, and a total area ratio at the uppermost level of the protrusions is 10 to 65% when
the surface is observed from above; and
wherein the base member has at least one indented portion having a depth of 100,000 to 5,000,000 nm to keep a droplet of the
liquid from rolling over the surface of the substrate.
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