| US 7,578,304 B2 | ||
| Cleaning and drying apparatus for substrate holder chuck and method thereof | ||
| Hiromi Ohtsuka, Tosu (Japan) | ||
| Assigned to Tokyo Electron Limited, Tokyo (Japan) | ||
| Filed on Aug. 19, 2004, as Appl. No. 10/923,309. | ||
| Claims priority of application No. 2003-294792 (JP), filed on Aug. 19, 2003; and application No. 2004-180094 (JP), filed on Jun. 17, 2004. | ||
| Prior Publication US 2005/0039779 A1, Feb. 24, 2005 | ||
| Int. Cl. B08B 3/02 (2006.01) | ||
| U.S. Cl. 134—95.2 | 11 Claims |
| 1. A cleaning and drying apparatus for a substrate holder chuck including a holding member having a plurality of holding grooves
formed in a row to hold a plurality of substrates, the plurality of holding grooves being formed on an upper face of the holding
member, the cleaning and drying apparatus comprising:
an atomize nozzle including a nozzle hole facing the upper face of the holding member for spraying a cleaning liquid and gas
to the upper face of the holding member;
a cleaning-liquid nozzle including a nozzle hole facing a side face of the holding member for spraying a cleaning liquid to
the side face of the holding member; and
a moving mechanism for moving the holding member in relation to the atomize nozzle and the cleaning-liquid nozzle in a direction
along the longitudinal direction of the holding member,
wherein the atomize nozzle and the cleaning liquid nozzle are provided at different positions along the longitudinal direction
of the holding member and thus face two different regions of the holding member when the holding member is in proximity of
said nozzles, the two different regions being displaced from each other at least along the longitudinal direction of the holding
member so that the atomize nozzle initially sprays the cleaning liquid and the gas to the upper face of respective parts of
the holding member and the cleaning-liquid nozzle subsequently sprays the cleaning liquid to the side face of said parts of
the holding member as the moving mechanism moves the holding member with respect to the atomize nozzle and the cleaning liquid
nozzle along the longitudinal direction from the atomize nozzle to the cleaning liquid nozzle.
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