US 7,576,036 B2
Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material
Hideo Nagasaki, Shizuoka-ken (Japan); Hisato Nagase, Shizuoka-ken (Japan); Toshihide Aoshima, Shizuoka-ken (Japan); and Shiki Ueki, Shizuoka-ken (Japan)
Assigned to FUJIFILM Corporation, Tokyo (Japan)
Filed on Aug. 02, 2006, as Appl. No. 11/497,400.
Claims priority of application No. 2005-224731 (JP), filed on Aug. 02, 2005.
Prior Publication US 2007/0032381 A1, Feb. 08, 2007
This patent is subject to a terminal disclaimer.
Int. Cl. B41M 5/42 (2006.01)
U.S. Cl. 503—226  [427/150; 503/200] 17 Claims
OG exemplary drawing
 
1. A heat-sensitive recording material, comprising a support, and at least one heat-sensitive recording layer and a protective layer provided on the support in this order,
wherein the protective layer contains a compound represented by the following Formula (1) and/or a compound represented by the following Formula (2):

OG Complex Work Unit Drawing
wherein in Formulae (1) and (2), X1 to X6 each independently represent NR1, S or O; R1 represents a hydrogen atom, an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, or a carbamoyl group; R2, R3 and R4 each independently represent a hydrogen atom, an alkyl group or a heterocyclic group; when at least two of R1, R2, R3 and R4 are other than a hydrogen atom, they may be bonded to each other to form a ring; R5 to R19 each independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an acyloxy group, an acylamino group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, a sulfamoyl group, or a halogen atom; and when at least two of R5 to R19 are other than a hydrogen atom, they may be bonded to each other to form a ring.