| US 7,576,033 B2 | ||
| Process for producing Bi12MO20 particles and photo-conductor layer for radiation imaging panels | ||
| Shigeru Nakamura, Kanagawa-ken (Japan) | ||
| Assigned to FUJIFILM Corporation, Tokyo (Japan) | ||
| Filed on Mar. 09, 2006, as Appl. No. 11/370,997. | ||
| Claims priority of application No. 2005/065128 (JP), filed on Mar. 09, 2005. | ||
| Prior Publication US 2006/0204423 A1, Sep. 14, 2006 | ||
| Int. Cl. B01J 23/18 (2006.01); B01J 23/14 (2006.01); C01B 33/20 (2006.01); C01G 29/00 (2006.01); C01G 19/02 (2006.01); C01G 17/00 (2006.01) | ||
| U.S. Cl. 502—353 [502/349; 423/326; 423/594.7; 423/618] | 17 Claims |
| 1. A process for producing Bi12MO20 particles, in which M represents an element selected from the group consisting of Si and Ge, the process comprising the steps
of:
i) preparing an alkaline solution of an alkali-soluble compound, which is selected from the group consisting of an alkali-soluble
silicon compound and an alkali-soluble germanium compound,
ii) preparing a water-soluble bismuth compound solution, and
iii) subjecting the alkaline solution and the water-soluble bismuth compound solution to mixing processing with agitation
at a temperature of at least 80° C. by use of a shearing agitator comprising a rotating blade and a stator,
whereby the alkaline solution and the water-soluble bismuth compound solution are allowed to react with each other;
wherein the mixing processing with agitation is performed while each of the alkaline solution and the water-soluble bismuth
compound solution is being added at a certain feed rate to an alkaline mother liquor having been heated to a temperature of
at least 80° C.
|