US 7,575,698 B2
TI and W containing transparent oxide electrode film
Yoshiyuki Abe, Ichikawa (Japan); and Noriko Ishiyama, Ichikawa (Japan)
Assigned to Sumitomo Metal Mining Co., Ltd., Tokyo (Japan)
Filed on Dec. 30, 2008, as Appl. No. 12/345,934.
Application 12/345934 is a division of application No. 10/677849, filed on Oct. 02, 2003, granted, now 7,507,357.
Claims priority of application No. 2002-292434 (JP), filed on Oct. 04, 2002; application No. 2002-359975 (JP), filed on Dec. 11, 2002; and application No. 2003-324825 (JP), filed on Sep. 17, 2003.
Prior Publication US 2009/0127519 A1, May 21, 2009
Int. Cl. H01B 1/08 (2006.01); H01L 31/00 (2006.01); H01L 31/0224 (2006.01)
U.S. Cl. 252—520.21  [204/192.15; 204/192.29; 136/258; 250/214.1] 8 Claims
OG exemplary drawing
 
1. A transparent oxide electrode film having indium oxide containing titanium and tungsten as its main component, wherein indium in said indium oxide is substituted with titanium and tungsten at a ratio which when the titanium/indium atomic ratio is deemed x and the tungsten/indium atomic ratio is deemed y, satisfies an equation (1), 0.019−1.90x≤y≤0.034−0.28x (1) and wherein said indium oxide is crystalline, and the resistivity is up to 5.7×10−4 Ωcm.