US 11,723,181 B2
Electromagnetic wave absorption film, electromagnetic wave absorption sheet
Taiga Matsushita, Saitama (JP)
Assigned to LINTEC Corporation, Tokyo (JP)
Appl. No. 17/434,978
Filed by LINTEC Corporation, Tokyo (JP)
PCT Filed Feb. 6, 2020, PCT No. PCT/JP2020/004578
§ 371(c)(1), (2) Date Aug. 30, 2021,
PCT Pub. No. WO2020/179349, PCT Pub. Date Sep. 10, 2020.
Claims priority of application No. 2019-037839 (JP), filed on Mar. 1, 2019; and application No. 2019-094552 (JP), filed on May 20, 2019.
Prior Publication US 2022/0142018 A1, May 5, 2022
Int. Cl. H01Q 17/00 (2006.01); H05K 9/00 (2006.01)
CPC H05K 9/00 (2013.01) [H01Q 17/007 (2013.01); H01Q 17/008 (2013.01)] 7 Claims
OG exemplary drawing
 
1. An electromagnetic wave absorption film comprising: a planar base; a first electromagnetic wave absorption pattern formed on the base; a second electromagnetic wave absorption pattern formed on the base; and a third electromagnetic wave absorption pattern formed on the base, wherein
when A [GHz] is defined as a frequency at which an absorption amount of an electromagnetic wave absorbed by the first electromagnetic wave absorption pattern has its local maximum value in a range from 20 to 110 GHz, B [GHz] satisfies Expression (1), B [GHz] being a frequency at which an absorption amount of an electromagnetic wave absorbed by the second electromagnetic wave absorption pattern has its local maximum value, and C [GHz] satisfies Expression (2), C [GHz] being a frequency at which an absorption amount of an electromagnetic wave absorbed by the third electromagnetic wave absorption pattern has its local maximum value,
1.037×A≤B≤1.30×A  Expression (1)
0.60×A≤C≤0.963×A  Expression (2).