US 11,723,152 B2
Oxygen and humidity control in storage device
Shen-Min Yang, Hsinchu (TW); Pu Kuan Fang, Zhubei (TW); Jyh-Shiou Hsu, Hsin-Chu (TW); and Mu-Tsang Lin, Hemei Township (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Jul. 23, 2020, as Appl. No. 16/937,004.
Claims priority of provisional application 62/965,221, filed on Jan. 24, 2020.
Prior Publication US 2021/0235583 A1, Jul. 29, 2021
Int. Cl. H05K 3/00 (2006.01)
CPC H05K 3/0055 (2013.01) [H05K 2203/085 (2013.01); H05K 2203/1178 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A storage device, comprising:
a top panel, a bottom panel, a back panel, a front panel, and two side panels configured to form an enclosed volume;
a plurality of protrusions disposed at inner surfaces of the two side panels and configured to hold a substrate;
a gas diffuser disposed at an inner surface of the back panel and configured to provide a purge gas to the enclosed volume;
an isolation gas device disposed on an inner surface of the top panel and adjacent to a top portion of the front panel, wherein the isolation gas device is configured to inject the purge gas into a front portion of the storage device and in a direction from the top panel toward the bottom panel; and
an isolation gas line disposed on the top panel and configured to connect the isolation gas device to the gas diffuser.