US 11,720,030 B2
Low dose charged particle metrology system
Fei Wang, Santa Clara, CA (US); Wei Fang, Milpitas, CA (US); and Kuo-Shih Liu, Fremont, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Oct. 26, 2021, as Appl. No. 17/510,524.
Application 17/510,524 is a continuation of application No. 16/755,127, granted, now 11,175,590, previously published as PCT/EP2018/077102, filed on Oct. 5, 2018.
Claims priority of provisional application 62/570,624, filed on Oct. 10, 2017.
Prior Publication US 2022/0113637 A1, Apr. 14, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/20 (2006.01); G01B 15/00 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01L 21/66 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70625 (2013.01) [G01B 15/00 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01L 22/12 (2013.01); H01J 2237/2817 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method of inspecting a sample using a charged particle beam, the method comprising:
acquiring one or more first measurements associated with a first instance of a feature in a first region of the sample;
acquiring one or more second measurements associated with a second instance of the feature in a second region of the sample; and
determining a combined measurement representing a parameter of the feature based on the one or more first measurements and the one or more second measurements.