US 11,720,013 B2
Graded interface in Bragg reflector
Wen Xiao, Singapore (SG); Vibhu Jindal, San Jose, CA (US); Weimin Li, Singapore (SG); and Shuwei Liu, Singapore (SG)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 30, 2022, as Appl. No. 17/708,593.
Application 17/708,593 is a division of application No. 16/850,665, filed on Apr. 16, 2020, granted, now 11,327,394.
Claims priority of provisional application 62/836,135, filed on Apr. 19, 2019.
Prior Publication US 2022/0221786 A1, Jul. 14, 2022
Int. Cl. G03F 1/24 (2012.01); G02B 5/08 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 1/24 (2013.01) [G02B 5/0891 (2013.01); G03F 7/7015 (2013.01); G03F 7/70316 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A method of manufacturing a Bragg reflector comprising alternating layers of first reflective material layer A and second reflective material layer B, the method comprising:
depositing a uniform first reflective material layer A on a substrate;
forming a first graded interfacial layer on the uniform first reflective material layer A, wherein the first graded interfacial layer comprises a thickness and a density gradient that changes across the thickness;
depositing a uniform second reflective material layer B on the first graded interfacial layer; and
forming a second graded interfacial layer on the uniform second reflective material layer B, wherein the second graded interfacial layer comprises a thickness and a density gradient that changes across the thickness, wherein the Bragg reflector is formed in a physical vapor deposition (PVD) chamber comprising a first material target A and a second material target B, wherein the PVD chamber comprises a rotating shield with a pair of shield holes comprising a first shield hole and a second shield hole.