CPC C23C 14/042 (2013.01) [C23C 14/56 (2013.01); C23C 16/042 (2013.01); C23C 16/4587 (2013.01); G03F 1/38 (2013.01); H01L 21/67346 (2013.01); H01L 21/67712 (2013.01); G01F 1/42 (2013.01); H10K 71/166 (2023.02)] | 23 Claims |
1. An apparatus for forming a pattern of deposited material on a substrate, comprising:
a mask arrangement, comprising:
a mask frame;
a mask device coupled to and supported by the mask frame, wherein the mask device is configured to be disposed between the substrate and a deposition source within a processing chamber, and the mask device extending in a first direction that is at an acute angle to a second direction that is parallel to a force of gravity;
an actuator configured to apply a gravity compensation force to the mask frame, wherein the gravity compensation force comprises a force that is applied in the first direction to the mask frame to compensate or correct for a deformation of the mask frame and the mask device caused by the force of gravity;
a carrier having a first surface that is configured to support the mask arrangement and is parallel to the first direction; and
a transport device that is configured to transport the mask arrangement and carrier for a process of forming the pattern of deposited material on the substrate.
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