| US 7,572,499 B2 | ||
| Contact magnetic transfer template | ||
| Zvonimir Z. Bandic, San Jose, Calif. (US); A. David Erpelding, San Jose, Calif. (US); Jordan Asher Katine, San Jose, Calif. (US); Quang Le, San Jose, Calif. (US); Kim Y. Lee, Fremont, Calif. (US); Jui-Lung Li, San Jose, Calif. (US); and Michael J. Rooks, Briarcliff Manor, N.Y. (US) | ||
| Assigned to Hitachi Global Storage Technologies Netherlands B.V., Amsterdam (Netherlands) | ||
| Filed on Jan. 26, 2005, as Appl. No. 11/44,777. | ||
| Prior Publication US 2006/0165959 A1, Jul. 27, 2006 | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. G11B 5/64 (2006.01); G11B 5/66 (2006.01); G11B 5/65 (2006.01); G11B 5/86 (2006.01) | ||
| U.S. Cl. 428—172 [428/826; 428/831; 428/832; 428/832.4; 428/835.7; 360/15; 360/16; 360/17] | 11 Claims |
| 1. A contact magnetic transfer template comprising:
a flexible plastic film having first and second opposite surfaces, the first surface containing islands of soft magnetic material
and nonmagnetic regions, the upper surfaces of the islands and nonmagnetic regions forming a continuous substantially planar
surface;
a rigid silicon support, wherein only the perimeter of the plastic film is attached to the silicon support; and
a barrier layer on the second surface of the plastic film and formed of a material resistant to a wet etchant capable of etching
silicon, the perimeter of the barrier layer being between the silicon support and the plastic film.
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