US 7,572,337 B2
	Blocker plate bypass to distribute gases in a chemical vapor deposition system
Juan Carlos Rocha-Alvarez, Sunnyvale, Calif. (US); Ganesh Balasubramanian, Sunnyvale, Calif. (US); Tom K. Cho, Palo Alto, Calif. (US); Deenesh Padhi, Sunnyvale, Calif. (US); Thomas Nowak, Cupertino, Calif. (US); Bok Hoen Kim, San Jose, Calif. (US); Hichem M'Saad, Santa Clara, Calif. (US); and Daemian Raj, Sunnyvale, Calif. (US)
Assigned to Applied Materials, Inc., Santa Clara, Calif. (US)
Filed on May 16, 2005, as Appl. No. 11/131,010.
Claims priority of provisional application 60/611852, filed on Sep. 21, 2004.
Claims priority of provisional application 60/574823, filed on May 26, 2004.
Prior Publication US 2005/0263248 A1, Dec. 01, 2005
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01)

U.S. Cl. 118—715  [156/345.33; 156/345.34]

15 Claims

1. An apparatus for distributing gases into a processing chamber, comprising: a gas distribution plate in the chamber, wherein the gas distribution plate has a plurality of apertures disposed therethrough; and a blocker plate spaced above the gas distribution plate, wherein the blocker plate has a plurality of apertures disposed therethrough and feed through passages extending through a center region of the blocker plate; wherein a first gas pathway is configured to deliver a first gas sequentially through the apertures of both the blocker plate and the gas distribution plate; and wherein a second gas pathway is configured to deliver a second gas (i) around the blocker plate and through the apertures of the gas distribution plate without passing through the blocker plate, and (ii) through the feed through passages extending through a center region of the blocker plate and through the apertures of the gas distribution plate, without mixing first and second gases prior to the first gas passing through the apertures of the blocker plate.