	US 7,569,482 B2
	Method for the selective removal of an unsilicided metal
Aomar Halimaoui, La Terrasse (France)
Assigned to STMicroelectronics (Crolles 2) SAS, Crolles Cedex (France)
Filed on Jan. 15, 2007, as Appl. No. 11/654,388.
Claims priority of application No. 06 00436 (FR), filed on Jan. 18, 2006.
Prior Publication US 2007/0197029 A1, Aug. 23, 2007
Int. Cl. H01L 21/302 (2006.01); H01L 21/461 (2006.01); H01L 21/4763 (2006.01); H01L 21/44 (2006.01)

U.S. Cl. 438—658 [438/752; 438/755; 438/650; 438/651]

21 Claims

1. A silicidation method, comprising:

deposition of at least one metal on a silicon-containing region;

formation of a metal silicide; and

removal of a residue of metal that has not been silicided during the formation of the metal silicide, wherein removal of the residue of metal comprises:

a) conversion of said residue of metal to an alloy containing a germanide of said metal; and

b) removal of said alloy by dissolving it in a chemical solution.