| US 7,567,037 B2 | ||
| High frequency power supply device and plasma generator | ||
| Yuichi Setsuhara, Minoh (Japan); Tatsuo Shoji, Nagoya (Japan); and Masayoshi Kamai, Kobe (Japan) | ||
| Assigned to Japan Science and Technology Agency, Saitma (Japan) | ||
| Appl. No. 10/542,289 PCT Filed Jan. 15, 2004, PCT No. PCT/JP2004/000258 § 371(c)(1), (2), (4) Date Jul. 15, 2005, PCT Pub. No. WO2004/064460, PCT Pub. Date Jul. 29, 2004. |
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| Claims priority of application No. 2003-008648 (JP), filed on Jan. 16, 2003. | ||
| Prior Publication US 2006/0057854 A1, Mar. 16, 2006 | ||
| Int. Cl. H05H 1/00 (2006.01) | ||
| U.S. Cl. 315—111.21 [315/111.51; 118/723 I; 118/723 AN; 156/345.48] | 24 Claims |
| 1. A high frequency power supplying device, having two or more loads which are capacitive or inductive, said high frequency
power supplying device comprising:
high frequency power sources for supplying power to the loads, each of the high frequency power sources being provided in
proximity to a corresponding load, wherein the proximity is such that a wiring length of the high frequency power source is
set so as to avoid formation of a standing wave in each of the loads.
|