	US 7,565,732 B2
	Method of manufacturing a write pole
Quang Le, San Jose, Calif. (US); Howard Zolla, San Jose, Calif. (US); and Nian-Xiang Sun, Sunnyvale, Calif. (US)
Assigned to Hitachi Global Storage Technologies Netherlands B.V., Amsterdam (Netherlands)
Filed on Aug. 31, 2004, as Appl. No. 10/931,649.
Prior Publication US 2006/0044681 A1, Mar. 02, 2006
Int. Cl. G11B 5/187 (2006.01); G11B 5/23 (2006.01)

U.S. Cl. 29—603.15 [29/603.12; 29/603.13; 216/22; 216/41; 216/47; 204/192.34; 360/317; 360/318; 360/319]

8 Claims

1. A method of fabricating a magnetic write head comprising:

depositing a layer of magnetic material on a flux guide layer;

depositing a first hard mask layer on said layer of magnetic material;

depositing a second hard mask layer on said first hard mask layer;

depositing a third hard mask layer on said second hard mask layer;

depositing a photo-resist layer upon said third hard mask layer;

patterning said photo-resist layer to define a write pole;

reactive ion etching said third hard mask layer exposed by said pattern photo-resist layer wherein a third hard mask defining said write pole is formed;

reactive ion etching said second hard mask layer and said first hard mask layer exposed by said patterned third hard mask wherein a first hard mask and second hard mask defining said write pole is formed;

ion milling said layer of magnetic material exposed by said second hard mask and said first hard mask wherein a beveled write pole is formed;

forming a conformal spacer upon a portion of a flare length proximate a tip of said beveled write pole; and

forming a shield layer upon said conformal spacer adjacent said flare length proximate said tip of said beveled write pole.