	US 7,403,228 B2
	Solid-state camera device and method of manufacturing the same, and method of making mask for manufacturing the device
Shinya Kamimura, Kitakatsuragi-gun (Japan); and Masashi Inoue, Sakai (Japan)
Assigned to Sharp Kabushiki Kaisha, Osaka (Japan)
Filed on Sep. 22, 2004, as Appl. No. 10/945,871.
Application 10/945871 is a division of application No. 09/580498, filed on May 30, 2000, abandoned.
Claims priority of application No. 1999/154954 (JP), filed on Jun. 02, 1999.
Prior Publication US 2005/0035377 A1, Feb. 17, 2005
Int. Cl. H04N 5/225 (2006.01); H04N 5/335 (2006.01)

U.S. Cl. 348—340 [348/280]

3 Claims

1. A method of manufacturing a solid-state camera device which comprises a plurality of light-receiving parts arranged at a constant interval on a substrate surface and a plurality of light-focusing parts disposed corresponding to each of the plurality of the light-receiving parts on the substrate surface so that incident light is focused on the light-receiving parts, wherein a position of each of the light-focusing parts is shifted monotonically larger toward a center of the camera region based on the position of each of the light-receiving parts corresponding to the light-focusing parts and a size along the substrate surface in the lateral direction of each of the light-focusing parts becomes gradually larger, as the location of the light-focusing part is getting closer to a peripheral camera region from a middle camera region on the substrate in front of an exit pupil, the method comprising:

forming a film of a composition for the light-focusing parts on a semi-conductor substrate on which the light-receiving parts have been formed, and

patterning the film of the composition for the light-focusing parts by exposing it by using a specified mask and by developing,

wherein the mask comprises a transparent substrate on which closed region patterns are disposed, said closed region pattern having positions and sizes corresponding to those of the light-focusing parts.