CPC H01L 33/06 (2013.01) [B82Y 20/00 (2013.01); B82Y 40/00 (2013.01); G01Q 60/16 (2013.01); G01Q 60/38 (2013.01); G01Q 80/00 (2013.01); Y10S 977/856 (2013.01)] | 9 Claims |
1. A nano-indent process for creating a single photon emitter in a two-dimensional materials platform, comprising the steps of:
providing a substrate;
providing a layer of polymer on the substrate;
providing a layer of two-dimensional material on the layer of polymer on the substrate;
utilizing a proximal
probe to apply mechanical stress to the layer of two-dimensional material and to the layer of polymer;
deforming the layer of two-dimensional material and the layer of polymer; and
forming a nano-indent in the two-dimensional material;
wherein the nano-indent comprises a single photon emitter.
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7. A single photon emitter in a two-dimensional materials platform, comprising:
a substrate;
a deformable polymer film on the substrate;
a two-dimensional material on the deformable polymer film; and
a nano-indent in the two-dimensional material and the deformable polymer film;
wherein the nano-indent comprises a permanent and localized strain field formed by application of mechanical stress from a tip of an atomic force microscope to the two-dimensional material and the deformable polymer film; and
wherein the nano-indent exhibits single photon emission in the two-dimensional material.
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