US 11,705,484 B2
Nanowire structure enhanced for stack deposition
Julien El Sabahy, Grenoble (FR); Frédéric Voiron, Barraux (FR); Paul-Henri Haumesser, Grenoble (FR); Pierre Noe, Grenoble (FR); and Guy Parat, Grenoble (FR)
Assigned to MURATA MANUFACTURING CO., LTD., Nagaokakyo (JP); and COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
Filed by Murata Manufacturing Co., Ltd., Nagaokakyo (JP); and COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
Filed on May 21, 2021, as Appl. No. 17/326,642.
Application 17/326,642 is a continuation of application No. PCT/EP2019/082156, filed on Nov. 21, 2019.
Claims priority of application No. 18306565 (EP), filed on Nov. 23, 2018.
Prior Publication US 2021/0280670 A1, Sep. 9, 2021
Int. Cl. H01G 4/008 (2006.01); H01G 4/012 (2006.01); H01G 4/33 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01L 49/02 (2006.01)
CPC H01L 28/91 (2013.01) [H01G 4/008 (2013.01); H01G 4/012 (2013.01); H01G 4/33 (2013.01); H01L 28/92 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A structure, comprising:
a first conductive layer;
first conductive wires having first ends that contact the first conductive layer and second ends that protrude from the first conductive layer;
a first lateral bridge layer that connects laterally a number of the first conductive wires to provide a substantially uniform spacing between the first conductive wires, wherein the first lateral bridge layer comprises a capping layer that caps the second ends of at least some of the first conductive wires, the capping layer being of a different material than the first conductive wires; and
an electrode-insulator-electrode stack or an insulator-electrode stack that coats the first conductive wires and the capping layer.