US 11,705,307 B2
Plasma system and filter device
Peng Chen, Beijing (CN)
Assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Appl. No. 17/641,415
Filed by BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
PCT Filed Aug. 21, 2020, PCT No. PCT/CN2020/110414
§ 371(c)(1), (2) Date Mar. 8, 2022,
PCT Pub. No. WO2021/047375, PCT Pub. Date Mar. 18, 2021.
Claims priority of application No. 201910845812.9 (CN), filed on Sep. 9, 2019.
Prior Publication US 2022/0270861 A1, Aug. 25, 2022
Int. Cl. H01J 37/32 (2006.01); B08B 7/00 (2006.01); B08B 13/00 (2006.01)
CPC H01J 37/32422 (2013.01) [B08B 7/0035 (2013.01); B08B 13/00 (2013.01); H01J 37/3244 (2013.01); H01J 37/32119 (2013.01); H01J 37/32715 (2013.01); H01J 37/32862 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A plasma system, comprising:
a dielectric window, an area surrounded by the dielectric window being configured as a first chamber and configured to accommodate plasma;
a first adapter arranged under the dielectric window, and an area surrounded by the first adapter being configured as a second chamber;
a lower electrode platform placed in the second chamber and configured to carry a workpiece; and
a filter device including:
a filter member placed at an intersection of the first chamber and the second chamber and including a plurality of through-holes configured to filter out ions in the plasma when the plasma in the first chamber enters the second chamber through the through-holes;
a first extension member extending from the filter member in a first direction, wherein the first extension member is placed over the first adapter, into the first chamber, and having an outermost end inside the dielectric window; and
a second extension member extending from a position of the filter member adjacent to the first extension member to an inner side of the first adapter in a second direction and configured to support the filter member, the second direction being perpendicular to the first direction.