US 11,705,301 B2
Charged particle beam manipulation device and method for manipulating charged particle beamlets
Benjamin John Cook, Munich (DE)
Assigned to ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH, Heimstetten (DE)
Filed by ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH, Heimstetten (DE)
Filed on Jan. 19, 2021, as Appl. No. 17/152,480.
Prior Publication US 2022/0230836 A1, Jul. 21, 2022
Int. Cl. H01J 37/14 (2006.01); H01J 37/145 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/145 (2013.01) [H01J 37/1471 (2013.01); H01J 37/3174 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/141 (2013.01); H01J 2237/1516 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for manipulating charged particle beamlets from a single charged particle source, the method comprising:
influencing, using a lens having a main optical axis, the charged particle beamlets from the single charged particle source, and
compensating, using a respective multipole of a first array of multipoles comprised within the lens, for a lens deflection force on a respective charged particle beamlet of the plurality of charged particle beamlets, wherein the lens is arranged to act on the plurality of charged particle beamlets, and wherein the first array of multipoles is as an array of micro-multipoles on a wafer formed using a microelectromechanical (MEMS) process,
the lens deflection force being a deflection force produced by the lens on the respective charged particle beamlet towards the main optical axis of the lens.