US 11,703,839 B2
Material processing path selection method and device
Lin Cui, Beijing (CN)
Assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Filed by BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Filed on Mar. 4, 2022, as Appl. No. 17/687,388.
Application 17/687,388 is a continuation of application No. PCT/CN2020/110409, filed on Aug. 21, 2020.
Claims priority of application No. 201910843955.6 (CN), filed on Sep. 6, 2019.
Prior Publication US 2022/0187807 A1, Jun. 16, 2022
Int. Cl. G05B 19/418 (2006.01); B08B 13/00 (2006.01); H01L 21/677 (2006.01)
CPC G05B 19/41865 (2013.01) [B08B 13/00 (2013.01); G05B 2219/32252 (2013.01); H01L 21/67739 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A material processing path selection method performed by a hardware processor, comprising:
calculating a plurality of candidate material processing paths;
determining a bottleneck process tank, the bottleneck process tank being a process tank having a highest use frequency among all process tanks, a use frequency of the process tank being equal to a total process time length of all materials that need to be transferred to the process tank divided by a number of all the materials that need to be transferred to the process tank;
for each of the plurality of candidate material processing paths, calculating a bottleneck process tank utilization rate to select a candidate material processing path with a highest bottleneck process tank utilization rate among the plurality of candidate material processing paths as a target material processing path, the bottleneck process tank utilization rate being equal to an operation time length of the bottleneck process tank in a current candidate material processing path divided by a process time length of the candidate material path; and
transferring each material of all the materials to an available process tank till all available process tanks are used for processing, according to the calculated target material processing path.