US 11,703,769 B2
Light source, EUV lithography system, and method for performing circuit layout patterning process
Chi Yang, Tainan (TW); Ssu-Yu Chen, New Taipei (TW); Shang-Chieh Chien, New Taipei (TW); Chieh Hsieh, Taoyuan (TW); Tzung-Chi Fu, Miaoli (TW); Bo-Tsun Liu, Taipei (TW); Li-Jui Chen, Hsinchu (TW); and Po-Chung Cheng, Zhongpu Township, Chiayi County (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on May 16, 2022, as Appl. No. 17/745,234.
Application 17/745,234 is a continuation of application No. 17/077,410, filed on Oct. 22, 2020, granted, now 11,333,983.
Application 17/077,410 is a continuation of application No. 16/057,208, filed on Aug. 7, 2018, granted, now 10,824,083, issued on Nov. 3, 2020.
Claims priority of provisional application 62/564,566, filed on Sep. 28, 2017.
Prior Publication US 2022/0276574 A1, Sep. 1, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01); H05G 2/00 (2006.01)
CPC G03F 7/70891 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70533 (2013.01); H05G 2/008 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A light source for extreme ultraviolet (EUV) radiation, comprising:
a target droplet generator configured to provide a plurality of target droplets to a source vessel;
a laser generator configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation; and
a controller configured to provide the control signal according to process parameters comprising a temperature of the source vessel and droplet positions of the target droplets;
wherein when the temperature of the source vessel exceeds a temperature threshold value and a standard deviation of the droplet positions of the target droplets exceeds a first standard deviation threshold value, the controller is configured to provide the control signal to the laser generator, so as to stop providing the first laser pulses.