CPC G03F 7/70891 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70533 (2013.01); H05G 2/008 (2013.01)] | 20 Claims |
1. A light source for extreme ultraviolet (EUV) radiation, comprising:
a target droplet generator configured to provide a plurality of target droplets to a source vessel;
a laser generator configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation; and
a controller configured to provide the control signal according to process parameters comprising a temperature of the source vessel and droplet positions of the target droplets;
wherein when the temperature of the source vessel exceeds a temperature threshold value and a standard deviation of the droplet positions of the target droplets exceeds a first standard deviation threshold value, the controller is configured to provide the control signal to the laser generator, so as to stop providing the first laser pulses.
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