US 11,703,670 B2
Optical assembly for scanning excitation radiation and/or manipulation radiation in a laser scanning microscope, and laser scanning microscope
Tiemo Anhut, Jena (DE); Matthias Wald, Jena (DE); Daniel Schwedt, Jena (DE); and Tobias Kaufhold, Jena (DE)
Assigned to CARL ZEISS MICROSCOPY GMBH, Jena (DE)
Appl. No. 16/641,516
Filed by Carl Zeiss Microscopy GmbH, Jena (DE)
PCT Filed Aug. 23, 2018, PCT No. PCT/EP2018/072805
§ 371(c)(1), (2) Date Feb. 24, 2020,
PCT Pub. No. WO2019/038398, PCT Pub. Date Feb. 28, 2019.
Claims priority of application No. 102017119478.9 (DE), filed on Aug. 25, 2017.
Prior Publication US 2021/0157117 A1, May 27, 2021
Int. Cl. G02B 21/00 (2006.01); G02B 26/10 (2006.01); G02B 27/28 (2006.01)
CPC G02B 21/0048 (2013.01) [G02B 21/006 (2013.01); G02B 21/0076 (2013.01); G02B 26/105 (2013.01); G02B 27/283 (2013.01)] 24 Claims
OG exemplary drawing
 
1. Optical arrangement for scanning at least one of excitation radiation and manipulation radiation in a laser scanning microscope, comprising:
a scanning optical unit for providing a first pupil plane;
a first beam-deflecting device, formed by a first scanner arranged in the first pupil plane, for scanning the excitation radiation and manipulation radiation in a first coordinate direction;
a first focusing device for producing a second pupil plane, which is optically conjugate to the first pupil plane;
a second beam-deflecting device for deflecting at least one of the excitation radiation and manipulation radiation, which is arranged in the second pupil plane;
a second focusing device for producing a third pupil plane, optically conjugate to the first pupil plane and the second pupil plane;
a third beam-deflecting device arranged in the third pupil plane for deflecting at least one of the excitation radiation and manipulation radiation; and
a variable beam-deflecting means for switching an optical beam path between a first beam pathway and a second beam pathway positioned between the first focusing device and the second pupil plane, and the second pupil plane and the second focusing device, and
wherein the first beam pathway extends at least from the third beam-deflecting device via the second beam-deflecting device to the first scanner and
wherein the second beam pathway extends at least from the third beam-deflecting device to the first scanner while bypassing the second beam-deflecting device via the variable beam-deflecting means; and
wherein the third beam-deflecting device in the third pupil plane is a third scanner for scanning at least one of the excitation radiation and the manipulation radiation in a second coordinate direction that differs from the first coordinate direction.