CPC C23C 16/4404 (2013.01) [H01L 21/76841 (2013.01)] | 9 Claims |
1. A batch-type substrate processing apparatus comprising:
a vertical reaction tube having an internal space for receiving a substrate boat in which a substrate is stacked in multiple stages;
a deposition gas supply unit configured to supply a deposition gas inside the reaction tube;
a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube; and
an adhesion layer coated on an inner wall of the reaction tube and to which a deposition by-product layer by an excess deposition gas is attached.
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