US 7,563,557 B2
Polyamide
Masashi Kimura, Fuji (Japan); Takayuki Kanada, Fuji (Japan); and Hiroyuki Hanahata, Sizuoka (Japan)
Assigned to Asahi Kasei EMD Corporation, Tokyo (Japan)
Appl. No. 11/571,311
PCT Filed Jul. 11, 2005, PCT No. PCT/JP2005/012730
§ 371(c)(1), (2), (4) Date Dec. 27, 2006,
PCT Pub. No. WO2006/008991, PCT Pub. Date Jan. 26, 2006.
Claims priority of application No. 2004-210575 (JP), filed on Jul. 16, 2004.
Prior Publication US 2007/0248910 A1, Oct. 25, 2007
Int. Cl. G03F 7/037 (2006.01); C08G 69/12 (2006.01)
U.S. Cl. 430—270.1  [430/283.1; 430/288.1; 528/310; 528/353] 13 Claims
 
1. A polyamide having a structure represented by the chemical formula (1):

OG Complex Work Unit Drawing
wherein m and n represent an integer satisfying m≧1, n≧1, 2≤(m+n)≤150 and 0.3≤m/(m+n)≤0.9, repeating units may be arranged blockwise or randomly, R1 and R2 each independently represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, a —COOR1 group and a —COOR2 group are each at an ortho position relative to a —CONH— group adjacent thereto, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 each independently represent at least one divalent organic group, and Z represents at least one monovalent organic group selected from the groups represented by the following chemical formula (2):

OG Complex Work Unit Drawing
wherein R3 represents at least one monovalent organic group having 1 to 9 carbon atoms and R4 represents at least one divalent organic group having 1 to 9 carbon atoms.