US 7,560,762 B2
Asymmetric floating gate NAND flash memory
Yen-Hao Shih, Changhua County (Taiwan); Chia-Hua Ho, Kaohsiung (Taiwan); Hang-Ting Lue, Hsinchu (Taiwan); Erh-Kun Lai, Taichung County (Taiwan); and Kuang Yeu Hsieh, Hsin Chu (Taiwan)
Assigned to Macronix International Co., Ltd., Hsinchu (Taiwan)
Filed on Aug. 23, 2005, as Appl. No. 11/209,437.
Prior Publication US 2007/0090442 A1, Apr. 26, 2007
Int. Cl. H01L 29/80 (2006.01)
U.S. Cl. 257—314  [257/288] 10 Claims
OG exemplary drawing
 
1. A memory device, comprising:
a substrate;
a plurality of wordlines disposed on and electrically insulated from the substrate;
and floating gates asymmetrically overlying respective wordlines, wherein a coupling ratio between a given one of the wordlines and its corresponding floating gate is sufficiently strong to induce an inversion channel below the corresponding floating gate.