| US 7,559,979 B2 | ||
| Hydrogen separator and method for production thereof | ||
| Ken-ichi Noda, Nagoya (Japan); and Osamu Sakai, Nagoya (Japan) | ||
| Assigned to NGK Insulators, Ltd., Nagoya (Japan) | ||
| Filed on Jan. 27, 2006, as Appl. No. 11/340,892. | ||
| Claims priority of application No. 2005-029498 (JP), filed on Feb. 04, 2005. | ||
| Prior Publication US 2006/0174767 A1, Aug. 10, 2006 | ||
| Int. Cl. B01D 53/22 (2006.01) | ||
| U.S. Cl. 96—11 [96/4; 96/10; 95/55; 95/56; 427/294; 427/299; 427/443.1] | 9 Claims |
| 1. A hydrogen separator comprising:
a porous substrate having a large number of pores communicating from a first surface to a second surface thereof; and
a hydrogen-separating layer disposed on the first surface of the porous substrate in a state that the hydrogen-separating
layer has a penetrated portion extending through the pores from the first surface to a particular depth;
wherein an average pore diameter at the first surface of the porous substrate whereon the hydrogen-separating layer is disposed
is 0.02 to 0.5 μm;
wherein a thickness of the hydrogen-separating layer is 1 to 5 μm;
wherein the first surface of the porous substrate on which the hydrogen-separating layer is disposed has a surface roughness
Ra of 1 μm or less; and
wherein a penetration depth of the penetrated portion is 0.05 to 1 μm, is at least equal to the average pore diameter at the
first surface of the porous substrate whereon the hydrogen-separating layer is disposed, and is not larger than one half of
the thickness of the hydrogen-separating layer.
|