| US 7,559,758 B2 | ||
| Mould for nano-printing, process for manufacturing such a mould and use of such a mould | ||
| Stefan Landis, Voiron (France); Laurent Mollard, Grenoble (France); Cecile Gourgon, Cessieu (France); and Jean-Herve Tortai, Meylan (France) | ||
| Assigned to Commissariat a l'Energie Atomique, Paris (France); and Centre National de la Recherche Scientifique, Paris (France) | ||
| Filed on Apr. 22, 2005, as Appl. No. 11/111,886. | ||
| Claims priority of application No. 04 50809 (FR), filed on Apr. 28, 2004. | ||
| Prior Publication US 2005/0253296 A1, Nov. 17, 2005 | ||
| Int. Cl. B29C 59/00 (2006.01) | ||
| U.S. Cl. 425—385 [425/215; 264/293] | 32 Claims |
| 1. A mould for nano-printing, comprising recess and projection type patterns, said mould comprising:
one or several ducts, each providing a communication between a mould pattern and a reservoir area,
wherein a duct has a cross-section that is smaller than a surface area of a pattern at which the duct opens up.
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