| US 7,558,643 B2 | ||
| Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby | ||
| Maurits Van Der Schaar, Veldhoven (Netherlands); Jeroen Huijbregtse, Breda (Netherlands); Sicco Ian Schets, Eindhoven (Netherlands); and Bart Luc Swinnen, Holsbeek (Belgium) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands); and IMEC v.z.w., Leuven (Belgium) | ||
| Filed on Dec. 09, 2004, as Appl. No. 11/7,578. | ||
| Application 11/007578 is a continuation in part of application No. 10/730254, filed on Dec. 09, 2003. | ||
| Prior Publication US 2005/0147902 A1, Jul. 07, 2005 | ||
| Int. Cl. G06F 19/00 (2006.01) | ||
| U.S. Cl. 700—121 | 25 Claims |
| 1. A method of determining at least one parameter of an object model used in a device manufacturing process, the object model
providing information about a position of an object, the object having a plurality of alignment marks with desired positions
that are known, the method comprising:
receiving signals from the plurality of alignment marks;
determining a strength of the received signals;
determining weighing coefficients based on the strength of the received signals;
measuring a plurality of positional parameters for the plurality of alignment marks, the plurality of positional parameters
being weighted with the weighing coefficients;
determining the at least one parameter of the object model based on the measured plurality of positional parameters, including
determining a numerical value of at least one of the weighing coefficients the at least one parameter of the object model
simultaneously; and
using the object model in the device manufacturing process.
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