| US 7,557,903 B2 | ||
| Lithographic apparatus and device manufacturing method | ||
| Carolus Johannes Catharina Schoormans, Hoge-Mierde (Netherlands); Emiel Jozef Melanie Eussen, Eindhoven (Netherlands); Willem Herman Gertruda Anna Koenen, Roermond (Netherlands); Nicolas Alban Lallemant, Veldhoven (Netherlands); Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot (Netherlands); and Johannes Mathias Theodorus Antonius Adriaens, Eindhoven (Netherlands) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
| Filed on Dec. 08, 2005, as Appl. No. 11/296,871. | ||
| Prior Publication US 2007/0132980 A1, Jun. 14, 2007 | ||
| Int. Cl. G03B 27/58 (2006.01); G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—72 [355/53] | 8 Claims |
| 1. A device manufacturing method comprising:
projecting a patterned beam of radiation onto a substrate;
determining a position of a movable object in a plurality of degrees of freedom using a plurality of sensors, said plurality
of sensors being at least one more in number than said plurality of degrees of freedom being measured, wherein said position
of said movable object in said plurality of degrees of freedom is determined using signals of each of said sensors; and
weighing said signals of said sensors by averaging said signals based on a difference between noise levels of each of said
sensors, such that an overall noise level of said sensors is optimally repressed.
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